Anti-EUV light source radiation grease

SEIVIOVaculub B042 resistEUV light source radiation greaseYesMade of high-purity linear perfluoropolyether oil, nano-level ultra-finePTFE thickens. It is refined by adding special anti-corrosion additives. It is a special clean grease specially used inside the cavity of EUV extreme ultraviolet lithography equipment, working in an environment of ultra-high vacuum and continuous irradiation of EUV extreme ultraviolet high-energy photons.

• Extremely low vapor pressure, low volatility, no release of small hydrocarbon molecules, preventing contamination of the EUV optical system;
• Under long-term irradiation with EUV light, molecules are not easily cracked and will not quickly become thinned, hardened, or coked;
• The C-F bond has extremely high bond energy and can directly resist EUV high-energy photon bombardment, and the molecular structure is not easily degraded;
• Resistant to plasma and active gases in the photolithography cavity, and does not corrode metal or optical components;
• Extremely low oil separation reduces base oil scattering, which can inhibit wafer contamination caused by base oil scattering;
• Silicone-free and halogen-free, there will be no "creep migration" problem and avoid contamination of EUV optical lenses;
• It has extremely high chemical stability and does not react with acids, alkalis and highly active substances.